Intrinsic magnetic properties of hexagonal LuFeO3 and the effects of nonstoichiometry

Jarrett A. Moyer, Rajiv Misra, Julia A. Mundy, Charles M. Brooks, John T. Heron, David A. Muller, Darrell G. Schlom, Peter Schiffer

Research output: Contribution to journalArticlepeer-review

Abstract

We used oxide molecular-beam epitaxy in a composition-spread geometry to deposit hexagonal LuFeO3 (h-LuFeO3) thin films with a monotonic variation in the Lu/Fe cation ratio, creating a mosaic of samples that ranged from iron rich to lutetium rich. We characterized the effects of composition variation with x-ray diffraction, atomic force microscopy, scanning transmission electron microscopy, and superconducting quantum interference device magnetometry. After identifying growth conditions leading to stoichiometric film growth, an additional sample was grown with a rotating sample stage. From this stoichiometric sample, we determined stoichiometric h-LuFeO3 to have a TN = 147 K and Ms = 0.018 μB/Fe.

Original languageEnglish (US)
Article number012106
JournalAPL Materials
Volume2
Issue number1
DOIs
StatePublished - Jan 2014

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

Fingerprint Dive into the research topics of 'Intrinsic magnetic properties of hexagonal LuFeO<sub>3</sub> and the effects of nonstoichiometry'. Together they form a unique fingerprint.

Cite this