Interval-valued statistical modeling of oxide chemical-mechanical polishing

James D. Ma, Claire F. Fang, Robin A Rutenbar, Xiaolin Xie, Duane S. Boning

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Technology-oriented tools provide the raw data needed to optimize the fabrication process itself, and to predict problematic variational impacts on silicon design. Unfortunately, even in these physics-oriented tools, statistically uncertain quantities appear as crucial inputs. To date, Monte Carlo techniques have been the dominant solution method. We suggest an alternative in which uncertainties are represented as correlated intervals, and interval-valued computations replace the standard scalar operations in the numerical algorithm for the tool. We use an oxide chemical-mechanical polishing tool as an example, and show how to "retrofit" workable statistical models on top of the original algorithm. Accuracies to within ∼1-10% of Monte Carlo simulation, and speedups of ∼10-100X can be achieved, depending on whether we choose a formulation which emphasizes accuracy, or efficiency.

Original languageEnglish (US)
Title of host publicationProceedings of theICCAD-2005
Subtitle of host publicationInternational Conference on Computer-Aided Design
Number of pages8
StatePublished - 2005
EventICCAD-2005: IEEE/ACM International Conference on Computer-Aided Design, 2005 - San Jose, CA, United States
Duration: Nov 6 2005Nov 10 2005

Publication series

NameIEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
ISSN (Print)1092-3152


OtherICCAD-2005: IEEE/ACM International Conference on Computer-Aided Design, 2005
Country/TerritoryUnited States
CitySan Jose, CA

ASJC Scopus subject areas

  • Software
  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design


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