Interface characterization in an InP/InGaAs resonant tunneling diode by scanning tunneling microscopy

S. L. Skala, W. Wu, J. R. Tucker, J. W. Lyding, A. Seabaugh, E. A. Beam, D. Jovanovic

Research output: Contribution to journalConference articlepeer-review

Abstract

The interfaces of a lattice-matched InP/InGaAs double-barrier resonant tunneling diode are studied by scanning tunneling microscopy. The interfaces have been mapped with atomic resolution for a length of over 4000 angstrom, and scanning tunneling microscopy images show the roughness to be very asymmetric with the inverted (InP on InGaAs) interface being considerably rougher than the normal interface. Roughness wave vectors determined from Fourier analysis are well fitted by a Lorentzian function and allow determination of roughness amplitudes and correlation lengths for the different interfaces. A chemical asymmetry between the interfaces is also observed in certain images which exhibit enhanced and reduced state densities at the normal and inverted interfaces, respectively. Termination of the growth surface by differing column V species during interface formation most likely affects the local state density.

Original languageEnglish (US)
Pages (from-to)660-663
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume13
Issue number2
DOIs
StatePublished - Mar 1995
EventProceedings of the 14th North American Conference on Molecular-Beam Epitaxy - Urbana, IL, USA
Duration: Oct 10 1994Oct 12 1994

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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