A significant enhancement (up to 30%) in the output pulse energy of a XeCl laser (l = 308 nm) is observed when ultraviolet-laser radiation at 193, 248, or 351 nm is injected into the XeCl resonator before the emission of the 308-nm pulse. In each case, it appears that the enhancement hinges on the presence of impurity molecules (e.g., hydrocarbons, N2, O2) in the XeCl-laser-gas mixture. For linjectrd= 193 and 248 nm, the external radiation appears to photoionize the impurity directly, whereas, at 351 nm, the impurity is photoexcited and subsequently ionized by the discharge. Strong absorption of 248-nm radiation by the XeCl active medium is observed during and following the XeCl discharge-an effect that is also attributed to impurities.
|Original language||English (US)|
|Number of pages||925|
|Journal||Journal of the Optical Society of America B: Optical Physics|
|State||Published - Jun 1985|
ASJC Scopus subject areas
- Statistical and Nonlinear Physics
- Atomic and Molecular Physics, and Optics