Integrated nanoscale silicon sensors using top-down fabrication

O. H. Elibol, D. Morisette, D. Akin, J. P. Denton, R. Bashir

Research output: Contribution to journalArticlepeer-review

Abstract

An overview is given of a fabrication method and initial test results on a silicon nanowire sensor that is realized using top-down microelectronics processing techniques. The method allows for the realization of truly integrated dense array of sensors. Initial testing of the devices showed sensitivity towards oxygen ambient, suggesting the possibility of using these sensors for chemical and biological detection.

Original languageEnglish (US)
Pages (from-to)4613-4615
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number22
DOIs
StatePublished - Dec 1 2003
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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