Infrared relfectance spectroscopy of very thin films of a-SiH

N. Maley; I. Szafranek; L. Mandrell; M. Katiyar; J. R. Abelson; J. A. Thornton

doi:10.1016/0022-3093(89)90100-2

Infrared relfectance spectroscopy of very thin films of a-SiH

N. Maley, I. Szafranek, L. Mandrell, M. Katiyar, J. R. Abelson, J. A. Thornton

Research output: Contribution to journal › Article › peer-review

Abstract

We demonstrate the ability of infrared reflectance spectroscopy to monitor the nature of SiH bonding in a-SiH films only ∼10Å thick. Measurements on reactive dc magnetron sputtered samples clearly show a SiH stretching mode at 2100cm^-1 in the thinnest films. The results also show systematic variations with film thickness and the hydrogen partial pressure during deposition. A simple model is presented to explain the observed results.

Original language	English (US)
Pages (from-to)	163-165
Number of pages	3
Journal	Journal of Non-Crystalline Solids
Volume	114
Issue number	PART 1
DOIs	https://doi.org/10.1016/0022-3093(89)90100-2
State	Published - Dec 1 1989

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Condensed Matter Physics
Materials Chemistry

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10.1016/0022-3093(89)90100-2

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title = "Infrared relfectance spectroscopy of very thin films of a-SiH",

abstract = "We demonstrate the ability of infrared reflectance spectroscopy to monitor the nature of SiH bonding in a-SiH films only ∼10{\AA} thick. Measurements on reactive dc magnetron sputtered samples clearly show a SiH stretching mode at 2100cm-1 in the thinnest films. The results also show systematic variations with film thickness and the hydrogen partial pressure during deposition. A simple model is presented to explain the observed results.",

author = "N. Maley and I. Szafranek and L. Mandrell and M. Katiyar and Abelson, {J. R.} and Thornton, {J. A.}",

note = "Funding Information: ACKNOWI .ET)GMF__,N'I~ This research is supported by the Electric Power Research Institute under the grant EPRI RP 8001-7. This paper is dedicated to Professor John Thornton, who initiated this research.",

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T1 - Infrared relfectance spectroscopy of very thin films of a-SiH

AU - Maley, N.

AU - Szafranek, I.

AU - Mandrell, L.

AU - Katiyar, M.

AU - Abelson, J. R.

AU - Thornton, J. A.

N1 - Funding Information: ACKNOWI .ET)GMF__,N'I~ This research is supported by the Electric Power Research Institute under the grant EPRI RP 8001-7. This paper is dedicated to Professor John Thornton, who initiated this research.

PY - 1989/12/1

Y1 - 1989/12/1

N2 - We demonstrate the ability of infrared reflectance spectroscopy to monitor the nature of SiH bonding in a-SiH films only ∼10Å thick. Measurements on reactive dc magnetron sputtered samples clearly show a SiH stretching mode at 2100cm-1 in the thinnest films. The results also show systematic variations with film thickness and the hydrogen partial pressure during deposition. A simple model is presented to explain the observed results.

AB - We demonstrate the ability of infrared reflectance spectroscopy to monitor the nature of SiH bonding in a-SiH films only ∼10Å thick. Measurements on reactive dc magnetron sputtered samples clearly show a SiH stretching mode at 2100cm-1 in the thinnest films. The results also show systematic variations with film thickness and the hydrogen partial pressure during deposition. A simple model is presented to explain the observed results.

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JO - Journal of Non-Crystalline Solids

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Infrared relfectance spectroscopy of very thin films of a-SiH

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