Keyphrases
Oxides
100%
Chemical Vapor Deposition
100%
Infrared Reflectance Spectroscopy
100%
Adsorbed Intermediates
100%
Beam Angle
100%
Incident Beam
83%
Reflection-absorption Infrared Spectroscopy (RAIRS)
66%
Dimethylamino
50%
Tetrakis
50%
Hafnium
50%
Refractive Index
33%
HfO2
33%
Submonolayer
33%
Surface Coverage
33%
Molecular Adsorbates
33%
Beam Path
33%
Incident Angle
33%
Signal-to-noise Ratio
16%
IR Spectra
16%
Adsorbate
16%
Chemical Vapor Deposition Processes
16%
Film Growth
16%
High Angle
16%
Infrared Spectra
16%
In Operando
16%
Growth Rate
16%
Depositional System
16%
Unpolarized
16%
Adsorbed Molecules
16%
Optical Response
16%
Insulating Thin Films
16%
Polarized Light
16%
Magnesium
16%
Dielectric Layer
16%
Direct Detection
16%
Dielectric Film
16%
Sensitivity to Change
16%
Dielectric Thin Films
16%
IR Absorption
16%
Thickness Dependence
16%
Oxide Thickness
16%
Optical Theory
16%
Beta-blockers
16%
Metal Substrate
16%
Inhibition Mechanism
16%
Thickness Index
16%
High-intensity Beam
16%
Four-layer
16%
Deposition Mechanism
16%
Internal Beam
16%
Vacuum Deposition
16%
Material Science
Oxide Compound
100%
Chemical Vapor Deposition
100%
Reflection-Absorption Infrared Spectroscopy
100%
Hafnium
75%
Surface (Surface Science)
75%
Thin Films
50%
Refractive Index
50%
Dielectric Material
50%
Monolayers
25%
Adsorbate
25%
Vapor Phase Deposition
25%
Film Growth
25%
Signal-to-Noise Ratio
25%
Magnesium
25%
Dielectric Films
25%
Vacuum Deposition
25%
Optical Multilayers
25%
Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Beam Angle
100%
Incident Beam
83%
Thin Films
33%
Refractive Index
33%
Surface Coverage
33%
Adsorbed Molecule
33%
Incident Angle
33%
Refractivity
33%
Signal-to-Noise Ratio
16%
Adsorbate
16%
Dielectrics
16%
Deposition System
16%
Deposition Process
16%
Polarized Light
16%
Dielectric Layer
16%
Oxide Thickness
16%
Consumables
16%
Direct Detection
16%
Deposition Mechanism
16%
Relative Sensitivity
16%
Monolayers
16%
Dielectric Film
16%
Chemical Engineering
Vapor Deposition
100%
Chemical Vapor Deposition
100%
Film
100%
Hafnium
75%
Operando
25%
Vacuum Deposition
25%