Influence of target-substrate angle on the elemental concentration of c-axis YBa2Cu3O7-x thin films

D. E. Pugel, Laura Greene

Research output: Contribution to journalArticlepeer-review

Abstract

The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that c-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa2Cu3O7-x in the bulk with dramatic changes in the surface morphology and deposition rate. In addition to the common materials characterization techniques of scanning electron microscopy, x-ray diffraction, transport measurements, and conventional Rutherford backscattering spectrometry (RBS), angle-dependent RBS is employed to probe surface inhomogeneities of films grown at target-substrate angles away from the standard off-axis position.

Original languageEnglish (US)
Pages (from-to)1589-1591
Number of pages3
JournalApplied Physics Letters
Volume75
Issue number11
DOIs
StatePublished - Sep 13 1999

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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