Inductively coupled plasma reactive ion etching of ZrO₂:H solid electrolyte film in BCl₃-based plasmas

Engineering & Materials Science

• Inductively coupled plasma 100%
• Plasma etching 99%
• Solid electrolytes 94%
• Plasmas 61%
• Auger electron spectroscopy 52%
• Stoichiometry 45%
• Atomic force microscopy 42%
• Bias voltage 41%
• Surface roughness 27%
• Scanning electron microscopy 26%

Chemical Compounds

• Solid Electrolyte 67%
• Inductively Coupled Plasma 66%
• Etching 60%
• Plasma 41%
• Auger Electron Spectroscopy 38%
• Volatile Agent 36%
• Surface Roughness 33%
• Liquid Film 32%
• Coil 32%
• Reaction Stoichiometry 27%
• Atomic Force Microscopy 26%
• Ion 26%
• Scanning Electron Microscopy 20%
• Chemistry 19%
• Pressure 19%
• Purity 16%
• Mixture 14%
• Surface 10%