Abstract
In-situ high-temperature scanning tunneling microscopy was used to follow the coarsening (Ostwald ripening) and decay kinetics of single and multiple two-dimensional TiN islands on atomically flat TiN(001) terraces and in single-atom deep vacancy pits at temperatures of 750-950°C. The rate-limiting mechanism for island decay was found to be surface diffusion rather than adatom attachment/detachment at island edges. We have modeled island-decay kinetics based upon the Gibbs-Thomson and steady state diffusion equations to obtain a step-edge energy per unit length of 0.23 ± 0.05 eV/Å and an activation energy for adatom formation and diffusion of 3.4 ± 0.3 eV.
Original language | English (US) |
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Pages (from-to) | 589-593 |
Number of pages | 5 |
Journal | Surface Review and Letters |
Volume | 7 |
Issue number | 5-6 |
DOIs | |
State | Published - 2000 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry