In-situ fabrication of {111} mirror and optical bench using double-sided anisotropic wet etching of {100} silicon wafer

Jung Mu Kim, Hyunseok Kim, Sunghyun Yoo, Kook Nyung Lee, Yong Kweon Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This work presents a novel fabrication method for {111} dual mirror and optical bench using double-sided anisotropic wet etching of 100> oriented silicon wafer. The roughness of the wet etched {111} plane is 8 nm.

Original languageEnglish (US)
Title of host publication2012 International Conference on Optical MEMS and Nanophotonics, OMN 2012
Pages125-126
Number of pages2
DOIs
StatePublished - 2012
Externally publishedYes
Event2012 International Conference on Optical MEMS and Nanophotonics, OMN 2012 - Banff, AB, Canada
Duration: Aug 6 2012Aug 9 2012

Publication series

NameInternational Conference on Optical MEMS and Nanophotonics
ISSN (Print)2160-5033
ISSN (Electronic)2160-5041

Conference

Conference2012 International Conference on Optical MEMS and Nanophotonics, OMN 2012
Country/TerritoryCanada
CityBanff, AB
Period8/6/128/9/12

Keywords

  • 100> oriented silicon
  • double-sided anisotropic wet etching
  • optical bench
  • {111} mirror

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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