Abstract
Diffusion of Si into quantum-well heterostructures and superlattices employing the high gap III-V quaternary system Iny (Al xGa1-x) 1-yP is shown to result in impurity-induced layer disordering. Secondary ion mass spectroscopy, transmission electron microscopy, and photoluminescence data indicate that the diffusion of Si into an InAlP-InGaP superlattice grown lattice matched on GaAs (y≊0.5) results in the intermixing of the layers, thus forming an alloy of average composition. Buried-heterostructure lasers are fabricated using Si layer disordering of In0.5 (Alx Ga1-x) 0.5 P p-n quantum-well heterostructures. The disorder-defined stripe-geometry diode lasers operate pulsed at 300 K near 6400 Å. Continuous wave operation at λ∼6255 Å is achieved at -47°C.
Original language | English (US) |
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Pages (from-to) | 482-487 |
Number of pages | 6 |
Journal | Journal of Applied Physics |
Volume | 66 |
Issue number | 2 |
DOIs | |
State | Published - 1989 |
ASJC Scopus subject areas
- General Physics and Astronomy