Improving Electrodeposition of Mg through an Open Circuit Potential Hold

Jennifer L. Esbenshade; Christopher J. Barile; Timothy T. Fister; Kimberly L. Bassett; Paul Fenter; Ralph G Nuzzo; Andrew A Gewirth

doi:10.1021/acs.jpcc.5b07825

Improving Electrodeposition of Mg through an Open Circuit Potential Hold

Jennifer L. Esbenshade, Christopher J. Barile, Timothy T. Fister, Kimberly L. Bassett, Paul Fenter, Ralph G Nuzzo, Andrew A Gewirth

Research output: Contribution to journal › Article

Abstract

We used in situ X-ray diffraction, XPS, SEM, and electrochemical methods to interrogate the mechanism of Mg electrodeposition from PhMgCl/AlCl ₃ (APC) and EtMgCl electrolytes. An open circuit potential (OCP) pause following Mg deposition led to retained enhancement of Mg deposition and stripping kinetics along with lowered overpotentials for both. In situ X-ray diffraction demonstrated that the OCP pause led to a more polycrystalline deposit relative to that without the pause, while SEM presented micrographs that showed smaller deposits with an OCP hold. The improvement is attributed to an 'enhancement layer' that formed on the electrode during the OCP hold. Analysis of XPS data suggests that the 'enhancement layer' consists of Mg and Cl retained on the electrode surface, possibly following electrode depassivation.

Original language	English (US)
Pages (from-to)	23366-23372
Number of pages	7
Journal	Journal of Physical Chemistry C
Volume	119
Issue number	41
DOIs	https://doi.org/10.1021/acs.jpcc.5b07825
State	Published - Oct 15 2015

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Energy(all)
Physical and Theoretical Chemistry
Surfaces, Coatings and Films

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Esbenshade, J. L., Barile, C. J., Fister, T. T., Bassett, K. L., Fenter, P., Nuzzo, R. G., & Gewirth, A. A. (2015). Improving Electrodeposition of Mg through an Open Circuit Potential Hold. Journal of Physical Chemistry C, 119(41), 23366-23372. https://doi.org/10.1021/acs.jpcc.5b07825

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title = "Improving Electrodeposition of Mg through an Open Circuit Potential Hold",

abstract = " We used in situ X-ray diffraction, XPS, SEM, and electrochemical methods to interrogate the mechanism of Mg electrodeposition from PhMgCl/AlCl 3 (APC) and EtMgCl electrolytes. An open circuit potential (OCP) pause following Mg deposition led to retained enhancement of Mg deposition and stripping kinetics along with lowered overpotentials for both. In situ X-ray diffraction demonstrated that the OCP pause led to a more polycrystalline deposit relative to that without the pause, while SEM presented micrographs that showed smaller deposits with an OCP hold. The improvement is attributed to an 'enhancement layer' that formed on the electrode during the OCP hold. Analysis of XPS data suggests that the 'enhancement layer' consists of Mg and Cl retained on the electrode surface, possibly following electrode depassivation. ",

author = "Esbenshade, {Jennifer L.} and Barile, {Christopher J.} and Fister, {Timothy T.} and Bassett, {Kimberly L.} and Paul Fenter and Nuzzo, {Ralph G} and Gewirth, {Andrew A}",

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T1 - Improving Electrodeposition of Mg through an Open Circuit Potential Hold

AU - Esbenshade, Jennifer L.

AU - Barile, Christopher J.

AU - Fister, Timothy T.

AU - Bassett, Kimberly L.

AU - Fenter, Paul

AU - Nuzzo, Ralph G

AU - Gewirth, Andrew A

PY - 2015/10/15

Y1 - 2015/10/15

N2 - We used in situ X-ray diffraction, XPS, SEM, and electrochemical methods to interrogate the mechanism of Mg electrodeposition from PhMgCl/AlCl 3 (APC) and EtMgCl electrolytes. An open circuit potential (OCP) pause following Mg deposition led to retained enhancement of Mg deposition and stripping kinetics along with lowered overpotentials for both. In situ X-ray diffraction demonstrated that the OCP pause led to a more polycrystalline deposit relative to that without the pause, while SEM presented micrographs that showed smaller deposits with an OCP hold. The improvement is attributed to an 'enhancement layer' that formed on the electrode during the OCP hold. Analysis of XPS data suggests that the 'enhancement layer' consists of Mg and Cl retained on the electrode surface, possibly following electrode depassivation.

AB - We used in situ X-ray diffraction, XPS, SEM, and electrochemical methods to interrogate the mechanism of Mg electrodeposition from PhMgCl/AlCl 3 (APC) and EtMgCl electrolytes. An open circuit potential (OCP) pause following Mg deposition led to retained enhancement of Mg deposition and stripping kinetics along with lowered overpotentials for both. In situ X-ray diffraction demonstrated that the OCP pause led to a more polycrystalline deposit relative to that without the pause, while SEM presented micrographs that showed smaller deposits with an OCP hold. The improvement is attributed to an 'enhancement layer' that formed on the electrode during the OCP hold. Analysis of XPS data suggests that the 'enhancement layer' consists of Mg and Cl retained on the electrode surface, possibly following electrode depassivation.

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