Improvement in enhanced spontaneous emission of resonant cavity light emitting transistors via inductively coupled plasma etching top distributed bragg reflector

Mong Kai Wu, Michael Liu, Milton Feng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report the improvement of light emission from resonant cavity light emitting transistor (RCLET) around 68% via Inductively Coupled Plasma (ICP) etching top distributed Bragg reflector (DBR). Due to the lateral feeding characteristics of RCLET, the radiative recombination takes place along the peripheral of the emitter. The smoothly etched sidewall achieved by ICP reduces the light scattering. Hence, the cavity quality factor (Q) increases. The enhanced recombination can be observed from reduced electrical gain in the family curve, an evidence of carrier lifetime reduction. The 10x3 μm 2 device shows the high optical bandwidth of 4GHz.

Original languageEnglish (US)
Title of host publication2013 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2013
Pages279-282
Number of pages4
StatePublished - Nov 15 2013
Event28th International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2013 - New Orleans, LA, United States
Duration: May 13 2013May 16 2013

Publication series

Name2013 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2013

Other

Other28th International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2013
CountryUnited States
CityNew Orleans, LA
Period5/13/135/16/13

Keywords

  • Distributed bragg reflector
  • Light emitting transistor
  • Resonant cavity

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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    Wu, M. K., Liu, M., & Feng, M. (2013). Improvement in enhanced spontaneous emission of resonant cavity light emitting transistors via inductively coupled plasma etching top distributed bragg reflector. In 2013 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2013 (pp. 279-282). (2013 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2013).