Illinois debris-mitigation EUV applications laboratory (IDEAL)

Keyphrases

• Attenuation 33%
• Collimator 33%
• Debris 66%
• Debris Mitigation 100%
• Dense Plasma Focus 33%
• Device Cost 33%
• Device Lifetime 33%
• Discharge Light 66%
• Erosion Mechanism 33%
• Fast Neutrals 33%
• Gas Discharge 33%
• Heavy Ions 33%
• Illinois 100%
• In Situ Diagnostics 33%
• Light Source 66%
• Mitigation System 33%
• Neutral Particles 33%
• Optical Lithography 33%
• Optical Mirror 33%
• Optics 66%
• Ownership Cost 33%
• Secondary Plasma 33%
• Solid Particle Erosion 33%
• Z-pinch Plasma 33%

Engineering

• Collimator 50%
• Erosion Process 50%
• Initial Data 50%
• Light Source 100%
• Optical Lithography 50%