Illinois debris-mitigation EUV applications laboratory (IDEAL)

B. E. Jurczyk, E. Vargas López, M. J. Neumann, D. N. Ruzic

Research output: Contribution to journalConference article

Abstract

Gaseous discharge light sources are leading candidates for generating 13.5 nm wavelengths needed for next-generation optical lithography. Electrode debris reaching the first collector optic is a serious concern for device lifetime and cost of ownership. This paper describes the experimental setup and initial data obtained for testing secondary-plasma-based debris mitigation for EUV gas discharge light sources. Operation of a dense plasma focus, secondary RF debris mitigation system, and several in-situ diagnostics were successfully tested, achieving first measurements for debris attenuation. It was also found that fast ion and fast neutral particle erosion processes at the optical mirror location dominate over deposition of sputtered metal if a collimator or "foil trap" is positioned between the hot pinch plasma and the first collector optic.

Original languageEnglish (US)
Pages (from-to)695-701
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5374
Issue numberPART 2
DOIs
StatePublished - Aug 18 2004
EventEmerging Lithographic Technologies VIII - Santa Clara, CA, United States
Duration: Feb 24 2004Feb 26 2004

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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