III-As pillar arrays by metal-assisted chemical etching for photonic applications

Parsian K. Mohseni, Lei Pan, Xiang Zhao, Seung Hyun Kim, Karthik Balasundaram, Jeong Dong Kim, James J. Coleman, Xiuling Li

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ordered arrays of GaAs/InGaAs micro and nanopillars are formed by metal-assisted chemical etching (MacEtch). The dependence of morphology and etch rate upon temperature, etchant composition, and doping concentration are explored and optical characteristics are discussed.

Original languageEnglish (US)
Title of host publication2013 Conference on Lasers and Electro-Optics, CLEO 2013
PublisherIEEE Computer Society
ISBN (Print)9781557529725
StatePublished - Jan 1 2013
Event2013 Conference on Lasers and Electro-Optics, CLEO 2013 - San Jose, CA, United States
Duration: Jun 9 2013Jun 14 2013

Publication series

Name2013 Conference on Lasers and Electro-Optics, CLEO 2013

Other

Other2013 Conference on Lasers and Electro-Optics, CLEO 2013
CountryUnited States
CitySan Jose, CA
Period6/9/136/14/13

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Fingerprint Dive into the research topics of 'III-As pillar arrays by metal-assisted chemical etching for photonic applications'. Together they form a unique fingerprint.

  • Cite this

    Mohseni, P. K., Pan, L., Zhao, X., Kim, S. H., Balasundaram, K., Kim, J. D., Coleman, J. J., & Li, X. (2013). III-As pillar arrays by metal-assisted chemical etching for photonic applications. In 2013 Conference on Lasers and Electro-Optics, CLEO 2013 [6833340] (2013 Conference on Lasers and Electro-Optics, CLEO 2013). IEEE Computer Society.