III-as pillar arrays by metal-assisted chemical etching for photonic applications

Parsian K. Mohseni, Lei Pan, Xiang Zhao, Seung Hyun Kim, Karthik Balasundaram, Jeong Dong Kim, James J. Coleman, Xiuling Li

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ordered arrays of GaAs/InGaAs micro and nanopillars are formed by metal-assisted chemical etching (MacEtch). The dependence of morphology and etch rate upon temperature, etchant composition, and doping concentration are explored and optical characteristics are discussed.

Original languageEnglish (US)
Title of host publicationCLEO
Subtitle of host publicationScience and Innovations, CLEO_SI 2013
StatePublished - 2013
EventCLEO: Science and Innovations, CLEO_SI 2013 - San Jose, CA, United States
Duration: Jun 9 2013Jun 14 2013

Other

OtherCLEO: Science and Innovations, CLEO_SI 2013
CountryUnited States
CitySan Jose, CA
Period6/9/136/14/13

Fingerprint

etchants
Photonics
Etching
Metals
Doping (additives)
etching
photonics
Chemical analysis
metals
Temperature
temperature
gallium arsenide

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

Cite this

Mohseni, P. K., Pan, L., Zhao, X., Kim, S. H., Balasundaram, K., Kim, J. D., ... Li, X. (2013). III-as pillar arrays by metal-assisted chemical etching for photonic applications. In CLEO: Science and Innovations, CLEO_SI 2013

III-as pillar arrays by metal-assisted chemical etching for photonic applications. / Mohseni, Parsian K.; Pan, Lei; Zhao, Xiang; Kim, Seung Hyun; Balasundaram, Karthik; Kim, Jeong Dong; Coleman, James J.; Li, Xiuling.

CLEO: Science and Innovations, CLEO_SI 2013. 2013.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Mohseni, PK, Pan, L, Zhao, X, Kim, SH, Balasundaram, K, Kim, JD, Coleman, JJ & Li, X 2013, III-as pillar arrays by metal-assisted chemical etching for photonic applications. in CLEO: Science and Innovations, CLEO_SI 2013. CLEO: Science and Innovations, CLEO_SI 2013, San Jose, CA, United States, 6/9/13.
Mohseni PK, Pan L, Zhao X, Kim SH, Balasundaram K, Kim JD et al. III-as pillar arrays by metal-assisted chemical etching for photonic applications. In CLEO: Science and Innovations, CLEO_SI 2013. 2013
Mohseni, Parsian K. ; Pan, Lei ; Zhao, Xiang ; Kim, Seung Hyun ; Balasundaram, Karthik ; Kim, Jeong Dong ; Coleman, James J. ; Li, Xiuling. / III-as pillar arrays by metal-assisted chemical etching for photonic applications. CLEO: Science and Innovations, CLEO_SI 2013. 2013.
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AU - Zhao, Xiang

AU - Kim, Seung Hyun

AU - Balasundaram, Karthik

AU - Kim, Jeong Dong

AU - Coleman, James J.

AU - Li, Xiuling

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