Hybrid photochemical/plasma reactor devices

James Gary Eden (Inventor), Sung-Jin Park (Inventor), Charles (Chul) Shin (Inventor), Andrey Mironov (Inventor)

Research output: Patent


A method for generating a hybrid reaction flows feedstock gas that is also a plasma medium through microchannels. Plasma is generated with the plasma medium via excitation with a time-varying voltage. UV or VUV emissions are generated at a wavelength selected to break a chemical bond in the feedstock gas. The UV or VUV emissions are directed into the microchannels to interact with the plasma medium and generate a reaction product from the plasma medium. A hybrid reactor device includes a microchannel plasma array having inlets and outlets for respectively flowing gas feedstock into and reaction product out of the microchannel plasma array. A UV or VUV emission lamp has its emissions directed into microchannels of the microchannel plasma array. Electrodes ignite plasma in the microchannels and stimulating the UV or VUV emission lamp to generate UV or VUV emissions. One common or plural phased time-varying voltage sources drive the plasma array and the UV or VUV emission lamp.
Original languageEnglish (US)
U.S. patent number10625235
StatePublished - Apr 21 2020


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