Hybrid lithography optimization with E-Beam and immersion processes for 16nm 1D gridded design

Yuelin Du, Hongbo Zhang, Martin D F Wong, Kai Yuan Chao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Since some of major IC industry participants are moving to the highly regular 1D gridded designs to enable scaling to sub-20nm nodes, how to manufacture the randomly distributed cuts with reasonable throughput and process variation becomes a big challenge. With the help of hybrid lithography, people can apply different types of processes for one single layer manufacturing such that the advantages from different technologies can be combined together to further benefit manufacturing. In this paper, targeting cut printing difficulties and hybrid lithography with electron beam (E-Beam) and 193 nm immersion (193i) processes, we propose a novel algorithm to optimally assign cuts to 193i or E-Beam processes with proper modifications on cut distribution, in order to maximize the overall throughput. To validate our method, we construct our algorithm based on the forbidden patterns obtained from the optical simulation; then we formulate the redistribution problem into a well defined ILP problem and finally call a reliable solver to solve the whole problem. Experimental results show that the throughput is dramatically improved by the cut redistribution. Besides that, for sparser layers, the EBL process can be totaly saved, which largely reduces the fabrication cost.

Original languageEnglish (US)
Title of host publicationASP-DAC 2012 - 17th Asia and South Pacific Design Automation Conference
Pages707-712
Number of pages6
DOIs
StatePublished - Apr 26 2012
Event17th Asia and South Pacific Design Automation Conference, ASP-DAC 2012 - Sydney, NSW, Australia
Duration: Jan 30 2012Feb 2 2012

Publication series

NameProceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC

Other

Other17th Asia and South Pacific Design Automation Conference, ASP-DAC 2012
CountryAustralia
CitySydney, NSW
Period1/30/122/2/12

Keywords

  • 1-D Gridded Design
  • Cut Redistribution
  • E-Beam Lithography
  • Hybrid Lithography

ASJC Scopus subject areas

  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design
  • Electrical and Electronic Engineering

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  • Cite this

    Du, Y., Zhang, H., Wong, M. D. F., & Chao, K. Y. (2012). Hybrid lithography optimization with E-Beam and immersion processes for 16nm 1D gridded design. In ASP-DAC 2012 - 17th Asia and South Pacific Design Automation Conference (pp. 707-712). [6165047] (Proceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC). https://doi.org/10.1109/ASPDAC.2012.6165047