Hole-mask colloidal nanolithography for large-area low-cost metamaterials and antenna-assisted surface-enhanced infrared absorption substrates

Stefano Cataldo, Jun Zhao, Frank Neubrech, Bettina Frank, Chunjie Zhang, Paul V. Braun, Harald Giessen

Research output: Contribution to journalArticlepeer-review

Abstract

Figure Persented: We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deuterated ODT, which demonstrates easy adjustability of our material to vibrational modes. Our method has the potential to make resonant plasmon-enhanced infrared spectroscopy a standard lab tool in biology, pharmacology, and medicine.

Original languageEnglish (US)
Pages (from-to)979-985
Number of pages7
JournalACS Nano
Volume6
Issue number1
DOIs
StatePublished - Jan 24 2012

Keywords

  • antenna-enhanced SEIRA substrate
  • hole-mask colloidal nanolithography
  • large-area low-cost metamaterials

ASJC Scopus subject areas

  • General Engineering
  • General Materials Science
  • General Physics and Astronomy

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