Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials

Jun Zhao, Bettina Frank, Frank Neubrech, Chunjie Zhang, Paul V. Braun, Harald Giessen

Research output: Contribution to journalArticlepeer-review

Abstract

Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this paper, we describe the fabrication process step by step. We manufacture a variety of different plasmonic structures ranging from simple nano-antennas over complex chiral structures to stacked composite materials for applications such as sensing. Additionally, we give details on the control of the nanostructure lateral density which allows for the multilayer-fabrication of complex nanostructures. In two accompanying movies, the fabrication strategy is explained and details are being demonstrated in the lab. The movies can be found at the website of Beilstein TV.

Original languageEnglish (US)
Pages (from-to)577-586
Number of pages10
JournalBeilstein Journal of Nanotechnology
Volume5
Issue number1
DOIs
StatePublished - 2014

Keywords

  • Hole-mask colloidal nanolithography
  • Localized surface plasmon resonance sensing
  • Low-cost large-area plasmonic nanostructures
  • Multilayer fabrication
  • Surface-enhanced infrared absorption spectroscopy (SERS)

ASJC Scopus subject areas

  • Materials Science(all)
  • Electrical and Electronic Engineering
  • Physics and Astronomy(all)

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