Highly uniform and reproducible vertical-cavity surface-emitting lasers grown by metallorganic chemical vapor deposition

H. Q. Hou, H. C. Chui, K. D. Choquette, B. E. Hammons, W. G. Brieland, K. M. Geib

Research output: Contribution to journalConference articlepeer-review

Abstract

Metallorganic chemical vapor deposition (MOCVD) technology is increasingly recognised as a superior platform for growth of vertical-cavity surface-emitting lasers (VCELs) because of its high throughput, low surface defect density, continuous compositional grading control, and the flexibility for materials and dopant choices. In this paper, it is shown that it is also capable of extremely high wafer uniformity and run-to-run reproducibility.

Original languageEnglish (US)
Pages (from-to)279-280
Number of pages2
JournalConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
StatePublished - 1996
Externally publishedYes
EventProceedings of the 1996 Conference on Lasers and Electro-Optics, CLEO'96 - Anaheim, CA, USA
Duration: Jun 2 1996Jun 7 1996

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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