Abstract
Metallorganic chemical vapor deposition (MOCVD) technology is increasingly recognised as a superior platform for growth of vertical-cavity surface-emitting lasers (VCELs) because of its high throughput, low surface defect density, continuous compositional grading control, and the flexibility for materials and dopant choices. In this paper, it is shown that it is also capable of extremely high wafer uniformity and run-to-run reproducibility.
Original language | English (US) |
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Pages (from-to) | 279-280 |
Number of pages | 2 |
Journal | Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS |
State | Published - 1996 |
Externally published | Yes |
Event | Proceedings of the 1996 Conference on Lasers and Electro-Optics, CLEO'96 - Anaheim, CA, USA Duration: Jun 2 1996 → Jun 7 1996 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering