Abstract
We measured the thermal conductivity κ of an 80μm thick hydrogenated amorphous silicon film prepared by hot-wire chemical-vapor deposition with the 3ω (80-300 K) and the time-domain thermoreflectance (300 K) methods. The κ is higher than any of the previous temperature dependent measurements and shows a strong phonon mean free path dependence. We also applied a Kubo based theory using a tight-binding method on three 1000 atom continuous random network models. The theory gives higher κ for more ordered models, but not high enough to explain our results, even after extrapolating to lower frequencies with a Boltzmann approach. Our results show that this material is more ordered than any amorphous silicon previously studied.
Original language | English (US) |
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Article number | 035901 |
Journal | Physical review letters |
Volume | 102 |
Issue number | 3 |
DOIs | |
State | Published - Jan 20 2009 |
ASJC Scopus subject areas
- General Physics and Astronomy