High-resolution strain measurement in shallow trench isolation structures using dynamic electron diffraction

Miyoung Kim, J. M. Zuo, Gyeong Su Park

Research output: Contribution to journalArticlepeer-review

Abstract

The electron diffraction strain measurement technique and its application to strain in shallow trench isolation (STI) device structures was analyzed. It was shown that polysilazane-based inorganic spin-on-glass (P-SOGS) filling leads to a lower stress level and the accuracy of our pattern matching technique at 0.02% using convergent-beam electron diffraction (CBED) technique. It was found that CBED technique improved the sample orientation which were required for techniques based on high-order Laue zone (HOLZ) line fitting using kinematical approximation. The spatial resolution was improved by using electron nano-probe in a field emission TEM.

Original languageEnglish (US)
Pages (from-to)2181-2183
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number12
DOIs
StatePublished - Mar 22 2004

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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