High resolution projection micro stereolithography system and method

Nicholas X Fang (Inventor), Matthew Paul Alonso (Inventor), Howon Lee (Inventor), Jun Xu (Inventor)

Research output: Patent


A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.
Original languageEnglish (US)
U.S. patent number9492969
Filing date5/31/11
StatePublished - Nov 16 2016


Dive into the research topics of 'High resolution projection micro stereolithography system and method'. Together they form a unique fingerprint.

Cite this