HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS.

I. Adesida; T. E. Everhart; R. Shimizu

doi:10.1116/1.570285

HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS.

I. Adesida, T. E. Everhart, R. Shimizu

Research output: Contribution to journal › Conference article › peer-review

Abstract

The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.

Original language	English (US)
Pages (from-to)	1743-1748
Number of pages	6
Journal	Journal of vacuum science & technology
Volume	16
Issue number	6
DOIs	https://doi.org/10.1116/1.570285
State	Published - 1979
Externally published	Yes
Event	Proc of the Symp on Electron, Ion and Photon Beam Technol, 15th - Boston, Mass Duration: May 29 1979 → Jun 1 1979

ASJC Scopus subject areas

Engineering(all)

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title = "HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS.",

abstract = "The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.",

author = "I. Adesida and Everhart, {T. E.} and R. Shimizu",

year = "1979",

doi = "10.1116/1.570285",

language = "English (US)",

volume = "16",

pages = "1743--1748",

journal = "Journal of Vacuum Science and Technology",

issn = "0022-5355",

publisher = "American Institute of Physics Publising LLC",

number = "6",

note = "Proc of the Symp on Electron, Ion and Photon Beam Technol, 15th ; Conference date: 29-05-1979 Through 01-06-1979",

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AU - Adesida, I.

AU - Everhart, T. E.

AU - Shimizu, R.

PY - 1979

Y1 - 1979

N2 - The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.

AB - The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.

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U2 - 10.1116/1.570285

DO - 10.1116/1.570285

M3 - Conference article

AN - SCOPUS:0018543989

VL - 16

SP - 1743

EP - 1748

JO - Journal of Vacuum Science and Technology

JF - Journal of Vacuum Science and Technology

SN - 0022-5355

IS - 6

T2 - Proc of the Symp on Electron, Ion and Photon Beam Technol, 15th

Y2 - 29 May 1979 through 1 June 1979

ER -

HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS.

Abstract

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