Abstract
The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1743-1748 |
| Number of pages | 6 |
| Journal | Journal of vacuum science & technology |
| Volume | 16 |
| Issue number | 6 |
| DOIs | |
| State | Published - Jan 1 1979 |
| Event | Proc of the Symp on Electron, Ion and Photon Beam Technol, 15th - Boston, Mass Duration: May 29 1979 → Jun 1 1979 |
Fingerprint
ASJC Scopus subject areas
- Engineering(all)
Cite this
HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS. / Adesida, Ilesanmi; Everhart, T. E.; Shimizu, R.
In: Journal of vacuum science & technology, Vol. 16, No. 6, 01.01.1979, p. 1743-1748.Research output: Contribution to journal › Conference article
}
TY - JOUR
T1 - HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS.
AU - Adesida, Ilesanmi
AU - Everhart, T. E.
AU - Shimizu, R.
PY - 1979/1/1
Y1 - 1979/1/1
N2 - The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.
AB - The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.
UR - http://www.scopus.com/inward/record.url?scp=0018543989&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0018543989&partnerID=8YFLogxK
U2 - 10.1116/1.570285
DO - 10.1116/1.570285
M3 - Conference article
AN - SCOPUS:0018543989
VL - 16
SP - 1743
EP - 1748
JO - Journal of Vacuum Science and Technology
JF - Journal of Vacuum Science and Technology
SN - 0022-5355
IS - 6
ER -