HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS.

Ilesanmi Adesida, T. E. Everhart, R. Shimizu

Research output: Contribution to journalConference article

Abstract

The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.

Original languageEnglish (US)
Pages (from-to)1743-1748
Number of pages6
JournalJournal of vacuum science & technology
Volume16
Issue number6
DOIs
StatePublished - Jan 1 1979
EventProc of the Symp on Electron, Ion and Photon Beam Technol, 15th - Boston, Mass
Duration: May 29 1979Jun 1 1979

Fingerprint

Electron beam lithography
Thin films
Electron scattering
Electrons
Substrates
Polymer films
Energy dissipation
Silicon

ASJC Scopus subject areas

  • Engineering(all)

Cite this

HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS. / Adesida, Ilesanmi; Everhart, T. E.; Shimizu, R.

In: Journal of vacuum science & technology, Vol. 16, No. 6, 01.01.1979, p. 1743-1748.

Research output: Contribution to journalConference article

Adesida, Ilesanmi ; Everhart, T. E. ; Shimizu, R. / HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS. In: Journal of vacuum science & technology. 1979 ; Vol. 16, No. 6. pp. 1743-1748.
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