Abstract
The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1743-1748 |
| Number of pages | 6 |
| Journal | Journal of vacuum science & technology |
| Volume | 16 |
| Issue number | 6 |
| DOIs | |
| State | Published - 1979 |
| Externally published | Yes |
| Event | Proc of the Symp on Electron, Ion and Photon Beam Technol, 15th - Boston, Mass Duration: May 29 1979 → Jun 1 1979 |
ASJC Scopus subject areas
- General Engineering