HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS.

Ilesanmi Adesida; T. E. Everhart; R. Shimizu

doi:10.1116/1.570285

HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS.

Ilesanmi Adesida, T. E. Everhart, R. Shimizu

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Research output: Contribution to journal › Conference article

Abstract

The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.

Original language	English (US)
Pages (from-to)	1743-1748
Number of pages	6
Journal	Journal of vacuum science & technology
Volume	16
Issue number	6
DOIs	https://doi.org/10.1116/1.570285
State	Published - Jan 1 1979
Event	Proc of the Symp on Electron, Ion and Photon Beam Technol, 15th - Boston, Mass Duration: May 29 1979 → Jun 1 1979

ASJC Scopus subject areas

Engineering(all)

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10.1116/1.570285

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Adesida, I., Everhart, T. E., & Shimizu, R. (1979). HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS. Journal of vacuum science & technology, 16(6), 1743-1748. https://doi.org/10.1116/1.570285

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abstract = "The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.",

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AU - Adesida, Ilesanmi

AU - Everhart, T. E.

AU - Shimizu, R.

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Y1 - 1979/1/1

N2 - The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.

AB - The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.

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