High-rate dry etching of ZnO in BCl3/CH4/H2 plasmas

Jeong Woon Bae, Chang Hyun Jeong, Han Ki Kim, Kyoung Kook Kim, Nam Gil Cho, Tae Yeon Seong, Seong Ju Park, Ilesanmi Adesida, Geun Young Yeom

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'High-rate dry etching of ZnO in BCl<sub>3</sub>/CH<sub>4</sub>/H<sub>2</sub> plasmas'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy