High-quality CoFe2O4 thin films with large coercivity grown via a wet chemical route

Chengxi Zhao; Anming Gao; Yansong Yang; Cheng Tu; Ankita Bhutani; Kathy A. Walsh; Songbin Gong; Daniel P. Shoemaker

doi:10.1063/1.5085232

High-quality CoFe₂O₄ thin films with large coercivity grown via a wet chemical route

Chengxi Zhao, Anming Gao, Yansong Yang, Cheng Tu, Ankita Bhutani, Kathy A. Walsh, Songbin Gong, Daniel P. Shoemaker

Research output: Contribution to journal › Article › peer-review

Abstract

In permanent magnet applications, response often scales with volume or dimension in power-conversion and magnetostrictive applications, even in film form. In microelectromechanical devices it is necessary to explore versatile methods of dense film deposition with film thicknesses approaching one micron. In this study, we present a wet chemical route to hard magnetic cobalt ferrite (CoFe₂O₄) films to produce films with large coercivity, controllable thickness, saturation approaching that of the bulk, and smoother morphology than state-of-the art sputtered or pulsed-laser-deposited films. The development of etching and releasing processes demonstrates how these films are suitable for precise engineering in a variety of form factors and applications.

Original language	English (US)
Article number	035126
Journal	AIP Advances
Volume	9
Issue number	3
DOIs	https://doi.org/10.1063/1.5085232
State	Published - Mar 1 2019

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1063/1.5085232

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title = "High-quality CoFe2O4 thin films with large coercivity grown via a wet chemical route",

abstract = "In permanent magnet applications, response often scales with volume or dimension in power-conversion and magnetostrictive applications, even in film form. In microelectromechanical devices it is necessary to explore versatile methods of dense film deposition with film thicknesses approaching one micron. In this study, we present a wet chemical route to hard magnetic cobalt ferrite (CoFe2O4) films to produce films with large coercivity, controllable thickness, saturation approaching that of the bulk, and smoother morphology than state-of-the art sputtered or pulsed-laser-deposited films. The development of etching and releasing processes demonstrates how these films are suitable for precise engineering in a variety of form factors and applications.",

author = "Chengxi Zhao and Anming Gao and Yansong Yang and Cheng Tu and Ankita Bhutani and Walsh, {Kathy A.} and Songbin Gong and Shoemaker, {Daniel P.}",

note = "Funding Information: This work was supported by the 2016 SPAR program of the Defense Advanced Research Projects Agency (DARPA). Cleanroom work was performed in the Micro and Nanotechnology Laboratory Facilities, University of Illinois at Urbana Champaign. Characterization was performed in the Materials Research Laboratory Central Research Facilities, University of Illinois at Urbana Champaign. Publisher Copyright: {\textcopyright} 2019 Author(s).",

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doi = "10.1063/1.5085232",

language = "English (US)",

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T1 - High-quality CoFe2O4 thin films with large coercivity grown via a wet chemical route

AU - Zhao, Chengxi

AU - Gao, Anming

AU - Yang, Yansong

AU - Tu, Cheng

AU - Bhutani, Ankita

AU - Walsh, Kathy A.

AU - Gong, Songbin

AU - Shoemaker, Daniel P.

N1 - Funding Information: This work was supported by the 2016 SPAR program of the Defense Advanced Research Projects Agency (DARPA). Cleanroom work was performed in the Micro and Nanotechnology Laboratory Facilities, University of Illinois at Urbana Champaign. Characterization was performed in the Materials Research Laboratory Central Research Facilities, University of Illinois at Urbana Champaign. Publisher Copyright: © 2019 Author(s).

PY - 2019/3/1

Y1 - 2019/3/1

N2 - In permanent magnet applications, response often scales with volume or dimension in power-conversion and magnetostrictive applications, even in film form. In microelectromechanical devices it is necessary to explore versatile methods of dense film deposition with film thicknesses approaching one micron. In this study, we present a wet chemical route to hard magnetic cobalt ferrite (CoFe2O4) films to produce films with large coercivity, controllable thickness, saturation approaching that of the bulk, and smoother morphology than state-of-the art sputtered or pulsed-laser-deposited films. The development of etching and releasing processes demonstrates how these films are suitable for precise engineering in a variety of form factors and applications.

AB - In permanent magnet applications, response often scales with volume or dimension in power-conversion and magnetostrictive applications, even in film form. In microelectromechanical devices it is necessary to explore versatile methods of dense film deposition with film thicknesses approaching one micron. In this study, we present a wet chemical route to hard magnetic cobalt ferrite (CoFe2O4) films to produce films with large coercivity, controllable thickness, saturation approaching that of the bulk, and smoother morphology than state-of-the art sputtered or pulsed-laser-deposited films. The development of etching and releasing processes demonstrates how these films are suitable for precise engineering in a variety of form factors and applications.

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