Abstract
The growth of the high-performance III-N electronic and optoelectronic devices using chemical vapor deposition technique was discussed. It was observed that adding indium in the channel of the AlGan/GaN HEMT structures can lead to more stable operation at high microwave powers with low power collapse. It was also observed that application of -1 volt bias resulted in an enhancement of the negative photoresponse below 300nm and reduction of the positive component of the photocurrent. It was suggested that growth conditions need to be adjusted to achieve comparable film quality of In-doped AlGaN/GaN HEMT structures.
| Original language | English (US) |
|---|---|
| Pages | 179-181 |
| Number of pages | 3 |
| State | Published - 2003 |
| Event | State-of-the-Art Program on Compound Semiconductors XXXIX and Nitride and Wide Bandgap Semiconductors for Sensors, Photonics, and Electronics IV - Proceedings of the Intenational Symposium - Orlando,FL, United States Duration: Oct 12 2003 → Oct 17 2003 |
Other
| Other | State-of-the-Art Program on Compound Semiconductors XXXIX and Nitride and Wide Bandgap Semiconductors for Sensors, Photonics, and Electronics IV - Proceedings of the Intenational Symposium |
|---|---|
| Country/Territory | United States |
| City | Orlando,FL |
| Period | 10/12/03 → 10/17/03 |
ASJC Scopus subject areas
- General Engineering
Fingerprint
Dive into the research topics of 'High performance wide-bandgap photonic and electronic devices grown by MBE'. Together they form a unique fingerprint.Cite this
- APA
- Standard
- Harvard
- Vancouver
- Author
- BIBTEX
- RIS