Abstract
Carbon nanotube (CNT) has been envisioned as a promising channel replacement for silicon in sub-5 nm logic technology nodes. Successful implementation of CNT-based CMOS technology requires high-quality low-resistance contacts for both ${p}$ - and ${n}$ -type field-effect transistors (PFETs and NFETs) that can be scaled down to sub-10 nm size. End-bonded contact schemes potentially provide the solution for ultrascaled contacts to CNTs with their low and size-independent contact resistances. In this paper, we report a new form of end-bonded metal contacts made by carbon dissolution into metal contacts with high carbon solubility (e.g., Ni and Co). This new approach requires low annealing temperature (400 °C-600 °C) and maintains metal integrity post contact formation, which has been the major issue in previous metal carbide-based demonstrations where typically >900 °C annealing is required. The end-bonded Ni contacts serve as robust ${p}$ -type contacts to CNTs, and perform better than standard side-bonded Pd contacts at scaled dimensions. In addition, for the first time, we demonstrate CMOS logic with end-bonded Ni contacts, featuring the smallest reported contact size thus far for CNT inverters. These findings could pave the way to realizing CNT-based scalable CMOS technology.
Original language | English (US) |
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Article number | 7906511 |
Pages (from-to) | 2744-2750 |
Number of pages | 7 |
Journal | IEEE Transactions on Electron Devices |
Volume | 64 |
Issue number | 6 |
DOIs | |
State | Published - Jun 2017 |
Externally published | Yes |
Keywords
- CMOS logic
- Carbon nanotube (CNT)
- end-bonded contact
- n-type field-effect transistors (NFET)
- nickel
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering