Keyphrases
Amorphous Silicon Thin Film
100%
Silane
100%
Substrate Temperature
100%
Plasma Sources
100%
Film Production
100%
High Deposition Rate
100%
Nanocrystalline Silicon Thin Films
100%
Surface Plasma Waves
100%
Defect Density
66%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
66%
Hydrogenated Nanocrystalline Silicon
66%
Amorphous Films
33%
Grain Size
33%
Photovoltaic Applications
33%
Hydrogenation
33%
Crystalline Phase
33%
A-Si
33%
Power Source
33%
Gas Mixture
33%
High-speed Flow
33%
Sharp Transition
33%
Silicon Thin Film
33%
Small Grain Size
33%
Poor Quality
33%
Electron Spin Resonance
33%
Hydrogenated Silicon Films
33%
Media Pressure
33%
Silane Plasma
33%
Surface Wave Antenna
33%
Material Science
Silicon
100%
Thin Films
100%
Amorphous Silicon
100%
Nanocrystalline Silicon
100%
Defect Density
66%
Crystalline Material
66%
Film
66%
Nanocrystalline
66%
Grain Size
66%
Plasma-Enhanced Chemical Vapor Deposition
66%
Amorphous Material
33%
Amorphous Film
33%
Silane
33%
Photovoltaics
33%
Hydrogenation
33%
Electron Paramagnetic Resonance Spectroscopy
33%
Gas Mixture
33%
Engineering
Thin Films
100%
Nanocrystalline
100%
Substrate Temperature
100%
Plasma Source
100%
High Deposition Rate
100%
Chemical Vapor Deposition
66%
Vapor Deposition
66%
Defect Density
66%
Flowrates
66%
Antenna
33%
Film Silicon
33%
Photovoltaics
33%
Crystalline Phase
33%
Power Source
33%
Gas Mixture
33%
Poor Quality
33%
Hydrogenation
33%
Chemical Engineering
Plasma Enhanced Chemical Vapor Deposition
100%
Deposition Rate
100%
Hydrogenation
50%
Silane
50%