HfB2 and Hf-B-N hard coatings by chemical vapor deposition

S. Jayaraman; J. E. Gerbi; Y. Yang; D. Y. Kim; A. Chatterjee; P. Bellon; G. S. Girolami; J. P. Chevalier; J. R. Abelson

doi:10.1016/j.surfcoat.2005.11.040

HfB₂ and Hf-B-N hard coatings by chemical vapor deposition

S. Jayaraman
, J. E. Gerbi
, Y. Yang
, D. Y. Kim
, A. Chatterjee
, P. Bellon
, G. S. Girolami
, J. P. Chevalier
, J. R. Abelson

Research output: Contribution to journal › Article › peer-review

Abstract

Hard, dense and conformal hafnium diboride (HfB₂) thin films were obtained by CVD from the precursor Hf[BH₄]₄ at deposition temperatures ≤ 350 °C. As-deposited films were X-ray amorphous but transformed to a nanocrystalline structure after being annealed at 700 °C. Amorphous HfB₂ films exhibited a respectable hardness of 20 GPa; the hardness increased in the nanocrystalline state to 40 GPa. Ternary Hf-B-N films, which consisted of a mixture of HfB₂, HfN and BN were obtained by adding atomic nitrogen to the growth flux. The formation of the softer a-BN phase produced a drop in the hardness and modulus values. A multilayer HfB₂/Hf-B-N exhibited a good combination of high hardness (33 GPa) and low elastic modulus (300 GPa).

Original language	English (US)
Pages (from-to)	6629-6633
Number of pages	5
Journal	Surface and Coatings Technology
Volume	200
Issue number	22-23 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.surfcoat.2005.11.040
State	Published - Jun 20 2006

Keywords

CVD
Hafnium borohydride
Hafnium diboride
Hard coating
Nanocomposite
Nanoindentation

ASJC Scopus subject areas

Surfaces, Coatings and Films
Condensed Matter Physics
Surfaces and Interfaces

Online availability

10.1016/j.surfcoat.2005.11.040

Library availability

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Cite this

@article{aa4f41a8ae5648c2aab0925796d8fabc,

title = "HfB2 and Hf-B-N hard coatings by chemical vapor deposition",

abstract = "Hard, dense and conformal hafnium diboride (HfB2) thin films were obtained by CVD from the precursor Hf[BH4]4 at deposition temperatures ≤ 350 °C. As-deposited films were X-ray amorphous but transformed to a nanocrystalline structure after being annealed at 700 °C. Amorphous HfB2 films exhibited a respectable hardness of 20 GPa; the hardness increased in the nanocrystalline state to 40 GPa. Ternary Hf-B-N films, which consisted of a mixture of HfB2, HfN and BN were obtained by adding atomic nitrogen to the growth flux. The formation of the softer a-BN phase produced a drop in the hardness and modulus values. A multilayer HfB2/Hf-B-N exhibited a good combination of high hardness (33 GPa) and low elastic modulus (300 GPa).",

keywords = "CVD, Hafnium borohydride, Hafnium diboride, Hard coating, Nanocomposite, Nanoindentation",

author = "S. Jayaraman and Gerbi, \{J. E.\} and Y. Yang and Kim, \{D. Y.\} and A. Chatterjee and P. Bellon and Girolami, \{G. S.\} and Chevalier, \{J. P.\} and Abelson, \{J. R.\}",

note = "The authors are grateful to the National Science Foundation for support of this research under grant number NSF DMR-0354060 and Centre National de la Recherche Scientifique for support under a projet de cooperation. Compositional and structural analyses of the films were carried out in the Center for Microanalysis of Materials, University of Illinois, which is partially supported by the U.S. Department of Energy under grant DEFG02-91-ER45439. The authors also acknowledge H.S. Seo for providing epitaxial TiN reference sample for nanoindentation.",

year = "2006",

month = jun,

day = "20",

doi = "10.1016/j.surfcoat.2005.11.040",

language = "English (US)",

volume = "200",

pages = "6629--6633",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "22-23 SPEC. ISS.",

}

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T1 - HfB2 and Hf-B-N hard coatings by chemical vapor deposition

AU - Jayaraman, S.

AU - Gerbi, J. E.

AU - Yang, Y.

AU - Kim, D. Y.

AU - Chatterjee, A.

AU - Bellon, P.

AU - Girolami, G. S.

AU - Chevalier, J. P.

AU - Abelson, J. R.

N1 - The authors are grateful to the National Science Foundation for support of this research under grant number NSF DMR-0354060 and Centre National de la Recherche Scientifique for support under a projet de cooperation. Compositional and structural analyses of the films were carried out in the Center for Microanalysis of Materials, University of Illinois, which is partially supported by the U.S. Department of Energy under grant DEFG02-91-ER45439. The authors also acknowledge H.S. Seo for providing epitaxial TiN reference sample for nanoindentation.

PY - 2006/6/20

Y1 - 2006/6/20

N2 - Hard, dense and conformal hafnium diboride (HfB2) thin films were obtained by CVD from the precursor Hf[BH4]4 at deposition temperatures ≤ 350 °C. As-deposited films were X-ray amorphous but transformed to a nanocrystalline structure after being annealed at 700 °C. Amorphous HfB2 films exhibited a respectable hardness of 20 GPa; the hardness increased in the nanocrystalline state to 40 GPa. Ternary Hf-B-N films, which consisted of a mixture of HfB2, HfN and BN were obtained by adding atomic nitrogen to the growth flux. The formation of the softer a-BN phase produced a drop in the hardness and modulus values. A multilayer HfB2/Hf-B-N exhibited a good combination of high hardness (33 GPa) and low elastic modulus (300 GPa).

AB - Hard, dense and conformal hafnium diboride (HfB2) thin films were obtained by CVD from the precursor Hf[BH4]4 at deposition temperatures ≤ 350 °C. As-deposited films were X-ray amorphous but transformed to a nanocrystalline structure after being annealed at 700 °C. Amorphous HfB2 films exhibited a respectable hardness of 20 GPa; the hardness increased in the nanocrystalline state to 40 GPa. Ternary Hf-B-N films, which consisted of a mixture of HfB2, HfN and BN were obtained by adding atomic nitrogen to the growth flux. The formation of the softer a-BN phase produced a drop in the hardness and modulus values. A multilayer HfB2/Hf-B-N exhibited a good combination of high hardness (33 GPa) and low elastic modulus (300 GPa).

KW - CVD

KW - Hafnium borohydride

KW - Hafnium diboride

KW - Hard coating

KW - Nanocomposite

KW - Nanoindentation

UR - https://www.scopus.com/pages/publications/33646125423

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U2 - 10.1016/j.surfcoat.2005.11.040

DO - 10.1016/j.surfcoat.2005.11.040

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AN - SCOPUS:33646125423

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SP - 6629

EP - 6633

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 22-23 SPEC. ISS.

ER -