We report a heated atomic force microscope cantilever with a heater region engineered to have high temperature sensitivity. The high resistivity (HR) heater region is phosphorous-doped silicon with a doping concentration of 1 × 1016 cm-3 and a resistivity of 0.53 Ω-cm. The heater has a temperature coefficient of resistance of 102 Ω C -1 over the temperature range 100-300 C, which is more than one order magnitude higher compared to heated cantilevers from previous publications. When used for thermal sensing of substrate nanotopography, the HR cantilever has a sensitivity of 0.37 mV/nm at 300 C. Because the HR cantilever has high sensitivity at relatively low temperatures, it can be used to measure substrates that cannot withstand high temperatures, demonstrated here as a polymer film grating of thickness 110 nm.

Original languageEnglish (US)
Pages (from-to)141-147
Number of pages7
JournalSensors and Actuators, A: Physical
StatePublished - Aug 12 2013


  • Atomic-force microscope (AFM)
  • Cantilever
  • Nanotopography
  • Temperature sensor

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electrical and Electronic Engineering

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