The thermal conductivity of a-Si: H thin films is determined in the temperature range 80-400 K in order to test recent theoretical calculations of heat transport in disordered harmonic solids. The hydrogen content of the a-Si:H films was varied from 1 to 20% using reactive magnetron sputtering and the data show little variation with hydrogen content. The low void fraction of these sputtered films and the phonon scattering provided by the film/substrate interface facilitate a quantitative comparison between experiment and theory. A simple extension of the theoretical calculation to include heat transport by long-wavelength phonons results in impressive agreement between experiment and theory.
|Original language||English (US)|
|Number of pages||6|
|Journal||Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties|
|State||Published - Apr 1995|
ASJC Scopus subject areas
- Chemical Engineering(all)
- Physics and Astronomy(all)