Abstract
Power-to-failure versus time-to-failure profiles for SOI protection devices are generated through a consideration of Joule heating. Experimental results are presented to justify assumptions made in the investigation of heat flow in SOI devices. A lossy transmission line equivalent model has been used to model the heat diffusion problem. A design space for multifinger NMOS protection devices has been developed on the basis of self-heating constraints. The method of images has been used to transform the multifinger device to an equivalent single-finger device to simplify the heat flow analysis.
Original language | English (US) |
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Pages (from-to) | 464-471 |
Number of pages | 8 |
Journal | IEEE Transactions on Electron Devices |
Volume | 44 |
Issue number | 3 |
DOIs | |
State | Published - 1997 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering