Abstract
Ion-implanted GaAs MESFET’s with half-micrometer gate length have been fabricated on 3-in-diameter GaAs substrates. At 16 GHz, a minimum noise figure of 0.8 dB with an associated gain of 6.3 dB has been measured. This noise-figure result is the lowest ever reported for 0.5- and 0.25-µm ion-implanted MESFET’s, and it is comparable to that for 0.25-µm HEMT’s at this frequency. By using the Fukui equation and the fitted equivalent circuit model, a Kffactor of 1.4 has been obtained. These results clearly demonstrate the potential of ion-implanted MESFET technology for K-band low-noise integrated circuit applications.
Original language | English (US) |
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Pages (from-to) | 409-411 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 10 |
Issue number | 9 |
DOIs | |
State | Published - Sep 1989 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering