Guided self-assembly of metallic nanowires and channels

Keyphrases

• Directed Self-assembly 100%
• Metallic Nanowires 100%
• Metallic Channel 100%
• Nanowires 33%
• Annealing 33%
• Silica 33%
• Nanochannel 33%
• Self-assembly Method 33%
• Si Substrate 33%
• Silicon Wafer 33%
• Tensile Stress 33%
• SiO2 Film 33%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 33%
• Control Network 33%
• Stress Concentration 33%
• Electroless Nickel 33%
• Concentration Phenomena 33%
• Crack number 33%

Material Science

• Nanowire 100%
• Self Assembly 100%
• Film 66%
• Annealing 33%
• Stress Concentration 33%
• Silicon Wafer 33%
• Ultimate Tensile Strength 33%
• Plasma-Enhanced Chemical Vapor Deposition 33%

Engineering

• Nanowires 100%
• Chemical Vapor Deposition 33%
• Vapor Deposition 33%
• Silicon Wafer 33%
• Si Substrate 33%
• Tensile Stress σ 33%
• Electroless Nickel 33%
• Stress Concentration Feature 33%