Keyphrases
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Heterostructure
100%
Atmospheric Pressure
100%
High Electron Mobility
100%
Pseudomorphic
100%
Transmission Electron Microscopy
66%
Carrier Concentration
66%
Variable Temperature
66%
Hall Effect Measurement
66%
Shubnikov-de Haas
66%
Magnetic Field
33%
Oscillation
33%
Heterojunction Interface
33%
2-dimensional Electron Gas (2DEG)
33%
Quantum Hall Effect
33%
Monotonic Increase
33%
Spacer Thickness
33%
Photoreflectance
33%
Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Heterostructures
100%
Atmospheric Pressure
100%
Carrier Concentration
66%
Transmissions
66%
Micrograph
33%
Magnetic Field
33%
Cross Section
33%
Two Dimensional
33%
Heterojunctions
33%
Photoreflectance
33%
Physics
Photoelectric Emission
100%
Metalorganic Chemical Vapor Deposition
100%
Transmission Electron Microscopy
100%
Atmospheric Pressure
100%
Electron Mobility
100%
Magnetic Field
50%
Heterojunctions
50%
Quantum Hall Effect
50%
Electron Gas
50%
Earth and Planetary Sciences
Atmospheric Pressure
100%
Transmission Electron Microscopy
100%
Metalorganic Chemical Vapor Deposition
100%
Electron Mobility
100%
Heterojunctions
50%
Quantum Hall Effect
50%
Electron Gas
50%
Material Science
Chemical Vapor Deposition
100%
Heterojunction
100%
Electron Mobility
100%
Carrier Concentration
50%
Transmission Electron Microscopy
50%