Growth mechanism and surface atomic structure of AgInSe 2

Pamela Pea Martin, Angus A. Rockett, Joseph Lyding

Research output: Contribution to journalArticle

Abstract

The growth of (112)A-oriented AgInSe 2 on GaAs (111)A and its surface reconstruction were studied by scanning tunneling microscopy, atomic force microscopy, and other techniques. Films were grown by a sputtering and evaporation method. Topographic STM images reveal that the film grew by atomic incorporation into surface steps resulting from screw dislocations on the surface. The screw dislocation density was ∼10 10 cm 2. Atomically resolved images also show that the surface atomic arrangement appears to be similar to that of the bulk, with a spacing of 0.35-0.41 nm. There is no observable reconstruction, which is unexpected for a polar semiconductor surface.

Original languageEnglish (US)
Article number04D115
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume30
Issue number4
DOIs
StatePublished - Jul 1 2012

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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