@inproceedings{ccc327bc1c944213a4403496cc572208,
title = "Grating couplers as optical probe pads in a standard CMOS process",
abstract = "To enable in-line nanophotonic device monitoring, grating couplers for near-vertical wafer-scale optical probing are fabricated in a standard CMOS process. These partially etched {"}optical probes{"} demonstrate a robust 3-dB-bandwidth larger than 80 nm allowing for photonic device characterization over the entire C-band throughout the fabrication process.",
keywords = "grating couplers, wafer-scale testing",
author = "Jens Hofrichter and Green, {William M.J.} and Folkert Horst and Solomon Assefa and Min Yang and Bert Offrein and Yurii Vlasov",
year = "2011",
doi = "10.1109/GROUP4.2011.6053738",
language = "English (US)",
isbn = "9781424483389",
series = "IEEE International Conference on Group IV Photonics GFP",
pages = "127--129",
booktitle = "8th IEEE International Conference on Group IV Photonics, GFP 2011",
note = "8th IEEE International Conference on Group IV Photonics, GFP 2011 ; Conference date: 14-09-2011 Through 16-09-2011",
}