@inproceedings{bf8cbc5d78764c9b839a62dd42075c36,
title = "Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry",
abstract = "Optical scatterometry is a model based technique, which conventionally requires minimization of a predefined least square function. This minimization relies heavily on the measurement configuration: wavelength, incident angle, azimuthal angle, and sample position, which brings up the question of how to find the configuration that maximizes measurement accuracy. We propose a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy can be approximated as a function of a Jacobian matrix with respect to the measurement configurations. Simulation and experiments for a one-dimensional trapezoidal grating establishes the feasibility of the proposed method.",
keywords = "Measurement configuration optimization, Mueller matrix ellipsometer, Scatterometry",
author = "Jinlong Zhu and Yating Shi and Shiyuan Liu and Goddard, {Lynford L.}",
note = "Publisher Copyright: {\textcopyright} 2016 SPIE.; 30th Conference on Metrology, Inspection, and Process Control for Microlithography ; Conference date: 22-02-2016 Through 25-02-2016",
year = "2016",
doi = "10.1117/12.2218988",
language = "English (US)",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Sanchez, {Martha I.} and Ukraintsev, {Vladimir A.}",
booktitle = "Metrology, Inspection, and Process Control for Microlithography XXX",
}