Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry

Jinlong Zhu, Yating Shi, Shiyuan Liu, Lynford L. Goddard

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Optical scatterometry is a model based technique, which conventionally requires minimization of a predefined least square function. This minimization relies heavily on the measurement configuration: wavelength, incident angle, azimuthal angle, and sample position, which brings up the question of how to find the configuration that maximizes measurement accuracy. We propose a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy can be approximated as a function of a Jacobian matrix with respect to the measurement configurations. Simulation and experiments for a one-dimensional trapezoidal grating establishes the feasibility of the proposed method.

Original languageEnglish (US)
Title of host publicationMetrology, Inspection, and Process Control for Microlithography XXX
EditorsMartha I. Sanchez, Vladimir A. Ukraintsev
PublisherSPIE
ISBN (Electronic)9781510600133
DOIs
StatePublished - Jan 1 2016
Event30th Conference on Metrology, Inspection, and Process Control for Microlithography - San Jose, United States
Duration: Feb 22 2016Feb 25 2016

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9778
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

Other30th Conference on Metrology, Inspection, and Process Control for Microlithography
CountryUnited States
CitySan Jose
Period2/22/162/25/16

Fingerprint

Scatterometry
Nanostructures
Configuration
optimization
Optimization
configurations
Angle
Square Functions
Jacobian matrices
Error Propagation
Jacobian matrix
Singular value decomposition
Gratings
Optimization Methods
Least Squares
Maximise
gratings
Wavelength
Model-based
decomposition

Keywords

  • Measurement configuration optimization
  • Mueller matrix ellipsometer
  • Scatterometry

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Zhu, J., Shi, Y., Liu, S., & Goddard, L. L. (2016). Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry. In M. I. Sanchez, & V. A. Ukraintsev (Eds.), Metrology, Inspection, and Process Control for Microlithography XXX [977823] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9778). SPIE. https://doi.org/10.1117/12.2218988

Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry. / Zhu, Jinlong; Shi, Yating; Liu, Shiyuan; Goddard, Lynford L.

Metrology, Inspection, and Process Control for Microlithography XXX. ed. / Martha I. Sanchez; Vladimir A. Ukraintsev. SPIE, 2016. 977823 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9778).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zhu, J, Shi, Y, Liu, S & Goddard, LL 2016, Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry. in MI Sanchez & VA Ukraintsev (eds), Metrology, Inspection, and Process Control for Microlithography XXX., 977823, Proceedings of SPIE - The International Society for Optical Engineering, vol. 9778, SPIE, 30th Conference on Metrology, Inspection, and Process Control for Microlithography, San Jose, United States, 2/22/16. https://doi.org/10.1117/12.2218988
Zhu J, Shi Y, Liu S, Goddard LL. Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry. In Sanchez MI, Ukraintsev VA, editors, Metrology, Inspection, and Process Control for Microlithography XXX. SPIE. 2016. 977823. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.2218988
Zhu, Jinlong ; Shi, Yating ; Liu, Shiyuan ; Goddard, Lynford L. / Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry. Metrology, Inspection, and Process Control for Microlithography XXX. editor / Martha I. Sanchez ; Vladimir A. Ukraintsev. SPIE, 2016. (Proceedings of SPIE - The International Society for Optical Engineering).
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