GAS PHASE SPECTROSCOPY OF A Ge FILM LCVD REACTOR.

J. F. Osmundsen, C. C. Abele, J. G. Eden

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The gas phase photochemistry of an LCVD reactor used to grow polycrystalline Ge films was studied by absorption and emission spectroscopy. Spatially, spectrally and temporally resolved atomic and molecular emissions are monitored as a function of gas pressure and laser intensity. These data lead to the conclusion that GeH//2 is predominantly produced directly from GeH//4.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposia Proceedings
EditorsA.Wayne Johnson, Daniel J. Ehrlich, Howard R. Schlossberg
PublisherNorth-Holland
Pages259-267
Number of pages9
ISBN (Print)0444008942
StatePublished - Dec 1 1984

Publication series

NameMaterials Research Society Symposia Proceedings
Volume29
ISSN (Print)0272-9172

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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  • Cite this

    Osmundsen, J. F., Abele, C. C., & Eden, J. G. (1984). GAS PHASE SPECTROSCOPY OF A Ge FILM LCVD REACTOR. In A. W. Johnson, D. J. Ehrlich, & H. R. Schlossberg (Eds.), Materials Research Society Symposia Proceedings (pp. 259-267). (Materials Research Society Symposia Proceedings; Vol. 29). North-Holland.