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GaN grown on hydrogen plasma cleaned 6H-SiC substrates
M. E. Lin
, S. Strite
, A. Agarwal
, A. Salvador
, G. L. Zhou
, N. Teraguchi
, A. Rockett
, H. Morkoç
Research output
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Article
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peer-review
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Keyphrases
6H-SiC
50%
6H-SiC Wafer
100%
AlN Buffer Layer
50%
Carbon Bonding
50%
Diffraction
50%
Epitaxial GaN
50%
GaN Epilayer
50%
GaN Layers
50%
Growth Chamber
50%
High-temperature Processing
50%
Hydrogen Plasma
100%
Kikuchi Patterns
50%
Limit of Detection
50%
Molecular Beam Epitaxy
100%
Passivated
50%
Photoemission
50%
Photoluminescence
50%
Plasma Enhanced
50%
Preparation Method
50%
SiC Substrate
100%
Substrate Preparation
50%
Substrate Surface
100%
Material Science
Aluminum Nitride
50%
Buffer Layer
50%
Epilayers
50%
Molecular Beam Epitaxy
100%
Photoluminescence
50%
Surface (Surface Science)
100%
Engineering
Buffer Layer
50%
Detection Limit
50%
Kikuchi Line
50%
Photoemission
50%
Ray Diffraction
50%
Substrate Surface
100%