@inproceedings{16a173afa1e74322afb4d9f338e86f7b,
title = "Focused ion beam (FIB) nanomachining of silicon carbide (SiC) stencil masks for nanoscale patterning",
abstract = "This work reports on experimental explorations of using focused ion beam (FIB) nanomachining of silicon carbide (SiC) thin membranes for making robust and high-quality nanostencil masks. We use thin films of polycrystalline SiC (poly-SiC), heteroepitaxial 3C-SiC, and amorphous SiC (a-SiC), prepared by different deposition processes on silicon (Si) substrates, and with thicknesses of t ∼250nm-1.6μm, to make suspended membranes. We have prototyped SiC nanostencil masks with features routinely down to ∼100nm.",
keywords = "3C-SiC, Amorphous SiC, Focused ion beam (FIB), Membrane, Nanolithography, Nanoscale patterning, Nanoscale stencil mask, Poly-SiC, Silicon carbide (SiC)",
author = "Hamidreza Zamani and Lee, {Seung Whan} and Amir Avishai and Zorman, {Christian A.} and {Mohan Sankaran}, R. and Feng, {Philip X.L.}",
note = "Copyright: Copyright 2020 Elsevier B.V., All rights reserved.; 14th International Conference on Silicon Carbide and Related Materials 2011, ICSCRM 2011 ; Conference date: 11-09-2011 Through 16-09-2011",
year = "2012",
doi = "10.4028/www.scientific.net/MSF.717-720.889",
language = "English (US)",
isbn = "9783037854198",
series = "Materials Science Forum",
publisher = "Trans Tech Publications Ltd",
pages = "889--892",
editor = "Devaty, {Robert P.} and Michael Dudley and Chow, {T. Paul} and Neudeck, {Philip G.}",
booktitle = "Silicon Carbide and Related Materials 2011, ICSCRM 2011",
}