Abstract
A semiconductor laser structure based upon a rib waveguide geometry which includes a uniform region and a flared and tapered region. The uniform region has a generally constant thickness and width. The flared tapered region gradually increases in width and decreases in thickness from the uniform region to a wide end. Fabrication is by selective area epitaxy with dielectric stripes in a dual stripe dielectric mask used to defined the two dimensional varying flare in the waveguide changing in thickness as a function of the flare width.
Original language | English (US) |
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U.S. patent number | 6317445 |
State | Published - Nov 13 2001 |