Abstract
A method for removing vapor phase contaminants from a gas stream. Sorbent particles are injected into the gas stream to react with vapor phase contaminants in the gas stream. Each sorbent particle is made from a support particle of a material coated with a layer of sorbent material different than the material of the support particle. The gas stream is directed through a particulate control device to remove the sorbent particles from the gas stream. A sorbent particle for use in the method and a method for manufacture of the sorbent particle are provided.
| Original language | English (US) |
|---|---|
| U.S. patent number | 5854173 |
| Filing date | 5/31/96 |
| State | Published - Dec 29 1998 |
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