Finding defects in a 22 nm node wafer with visible light

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Despite a diffraction limited lateral resolution of 360 nm, we detected 20 nm by 110 nm defects in a patterned 22 nm node wafer using quantitative phase and amplitude images from epiillumination diffraction phase microscopy.

Original languageEnglish (US)
Title of host publication2013 Conference on Lasers and Electro-Optics, CLEO 2013
PublisherIEEE Computer Society
ISBN (Print)9781557529725
StatePublished - Jan 1 2013
Event2013 Conference on Lasers and Electro-Optics, CLEO 2013 - San Jose, CA, United States
Duration: Jun 9 2013Jun 14 2013

Other

Other2013 Conference on Lasers and Electro-Optics, CLEO 2013
CountryUnited States
CitySan Jose, CA
Period6/9/136/14/13

Fingerprint

Diffraction
Defects
Microscopic examination

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Zhou, R., Popescu, G., & Goddard, L. L. (2013). Finding defects in a 22 nm node wafer with visible light. In 2013 Conference on Lasers and Electro-Optics, CLEO 2013 [6832945] IEEE Computer Society.

Finding defects in a 22 nm node wafer with visible light. / Zhou, Renjie; Popescu, Gabriel; Goddard, Lynford L.

2013 Conference on Lasers and Electro-Optics, CLEO 2013. IEEE Computer Society, 2013. 6832945.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zhou, R, Popescu, G & Goddard, LL 2013, Finding defects in a 22 nm node wafer with visible light. in 2013 Conference on Lasers and Electro-Optics, CLEO 2013., 6832945, IEEE Computer Society, 2013 Conference on Lasers and Electro-Optics, CLEO 2013, San Jose, CA, United States, 6/9/13.
Zhou R, Popescu G, Goddard LL. Finding defects in a 22 nm node wafer with visible light. In 2013 Conference on Lasers and Electro-Optics, CLEO 2013. IEEE Computer Society. 2013. 6832945
Zhou, Renjie ; Popescu, Gabriel ; Goddard, Lynford L. / Finding defects in a 22 nm node wafer with visible light. 2013 Conference on Lasers and Electro-Optics, CLEO 2013. IEEE Computer Society, 2013.
@inproceedings{427c63c0abca424c9b06d793467816c1,
title = "Finding defects in a 22 nm node wafer with visible light",
abstract = "Despite a diffraction limited lateral resolution of 360 nm, we detected 20 nm by 110 nm defects in a patterned 22 nm node wafer using quantitative phase and amplitude images from epiillumination diffraction phase microscopy.",
author = "Renjie Zhou and Gabriel Popescu and Goddard, {Lynford L}",
year = "2013",
month = "1",
day = "1",
language = "English (US)",
isbn = "9781557529725",
booktitle = "2013 Conference on Lasers and Electro-Optics, CLEO 2013",
publisher = "IEEE Computer Society",

}

TY - GEN

T1 - Finding defects in a 22 nm node wafer with visible light

AU - Zhou, Renjie

AU - Popescu, Gabriel

AU - Goddard, Lynford L

PY - 2013/1/1

Y1 - 2013/1/1

N2 - Despite a diffraction limited lateral resolution of 360 nm, we detected 20 nm by 110 nm defects in a patterned 22 nm node wafer using quantitative phase and amplitude images from epiillumination diffraction phase microscopy.

AB - Despite a diffraction limited lateral resolution of 360 nm, we detected 20 nm by 110 nm defects in a patterned 22 nm node wafer using quantitative phase and amplitude images from epiillumination diffraction phase microscopy.

UR - http://www.scopus.com/inward/record.url?scp=84903753375&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84903753375&partnerID=8YFLogxK

M3 - Conference contribution

SN - 9781557529725

BT - 2013 Conference on Lasers and Electro-Optics, CLEO 2013

PB - IEEE Computer Society

ER -