Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

S. W. Schmucker, N. Kumar, John R Abelson, S. R. Daly, Gregory S Girolami, M. R. Bischof, D. L. Jaeger, R. F. Reidy, B. P. Gorman, J. Alexander, J. B. Ballard, J. N. Randall, Joseph W Lyding

Research output: Contribution to journalArticle

Abstract

Fabrication of ultrasharp probes is of interest for many applications, including scanning probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultrasharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. Here we describe a novel biased-probe field-directed sputter sharpening technique applicable to conductive materials, which produces nanometer and sub-nanometer sharp W, Pt-Ir and W-HfB 2 tips able to perform atomic-scale lithography on Si. Compared with traditional probes fabricated by etching or conventional sputter erosion, field-directed sputter sharpened probes have smaller radii and produce lithographic patterns 18-26% sharper with atomic-scale lithographic fidelity.

Original languageEnglish (US)
Article number935
JournalNature communications
Volume3
DOIs
StatePublished - Aug 15 2012

Fingerprint

Scanning Probe Microscopy
Lithography
lithography
Electrons
probes
Fabrication
Conductive materials
Scanning probe microscopy
fabrication
Erosion
Etching
erosion
etching
microscopy
radii
scanning

ASJC Scopus subject areas

  • Chemistry(all)
  • Biochemistry, Genetics and Molecular Biology(all)
  • Physics and Astronomy(all)

Cite this

Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. / Schmucker, S. W.; Kumar, N.; Abelson, John R; Daly, S. R.; Girolami, Gregory S; Bischof, M. R.; Jaeger, D. L.; Reidy, R. F.; Gorman, B. P.; Alexander, J.; Ballard, J. B.; Randall, J. N.; Lyding, Joseph W.

In: Nature communications, Vol. 3, 935, 15.08.2012.

Research output: Contribution to journalArticle

Schmucker, SW, Kumar, N, Abelson, JR, Daly, SR, Girolami, GS, Bischof, MR, Jaeger, DL, Reidy, RF, Gorman, BP, Alexander, J, Ballard, JB, Randall, JN & Lyding, JW 2012, 'Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography', Nature communications, vol. 3, 935. https://doi.org/10.1038/ncomms1907
Schmucker, S. W. ; Kumar, N. ; Abelson, John R ; Daly, S. R. ; Girolami, Gregory S ; Bischof, M. R. ; Jaeger, D. L. ; Reidy, R. F. ; Gorman, B. P. ; Alexander, J. ; Ballard, J. B. ; Randall, J. N. ; Lyding, Joseph W. / Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. In: Nature communications. 2012 ; Vol. 3.
@article{6e2087f3a91042a48a2d7471a68ebdbe,
title = "Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography",
abstract = "Fabrication of ultrasharp probes is of interest for many applications, including scanning probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultrasharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. Here we describe a novel biased-probe field-directed sputter sharpening technique applicable to conductive materials, which produces nanometer and sub-nanometer sharp W, Pt-Ir and W-HfB 2 tips able to perform atomic-scale lithography on Si. Compared with traditional probes fabricated by etching or conventional sputter erosion, field-directed sputter sharpened probes have smaller radii and produce lithographic patterns 18-26{\%} sharper with atomic-scale lithographic fidelity.",
author = "Schmucker, {S. W.} and N. Kumar and Abelson, {John R} and Daly, {S. R.} and Girolami, {Gregory S} and Bischof, {M. R.} and Jaeger, {D. L.} and Reidy, {R. F.} and Gorman, {B. P.} and J. Alexander and Ballard, {J. B.} and Randall, {J. N.} and Lyding, {Joseph W}",
year = "2012",
month = "8",
day = "15",
doi = "10.1038/ncomms1907",
language = "English (US)",
volume = "3",
journal = "Nature Communications",
issn = "2041-1723",
publisher = "Nature Publishing Group",

}

TY - JOUR

T1 - Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

AU - Schmucker, S. W.

AU - Kumar, N.

AU - Abelson, John R

AU - Daly, S. R.

AU - Girolami, Gregory S

AU - Bischof, M. R.

AU - Jaeger, D. L.

AU - Reidy, R. F.

AU - Gorman, B. P.

AU - Alexander, J.

AU - Ballard, J. B.

AU - Randall, J. N.

AU - Lyding, Joseph W

PY - 2012/8/15

Y1 - 2012/8/15

N2 - Fabrication of ultrasharp probes is of interest for many applications, including scanning probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultrasharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. Here we describe a novel biased-probe field-directed sputter sharpening technique applicable to conductive materials, which produces nanometer and sub-nanometer sharp W, Pt-Ir and W-HfB 2 tips able to perform atomic-scale lithography on Si. Compared with traditional probes fabricated by etching or conventional sputter erosion, field-directed sputter sharpened probes have smaller radii and produce lithographic patterns 18-26% sharper with atomic-scale lithographic fidelity.

AB - Fabrication of ultrasharp probes is of interest for many applications, including scanning probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultrasharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. Here we describe a novel biased-probe field-directed sputter sharpening technique applicable to conductive materials, which produces nanometer and sub-nanometer sharp W, Pt-Ir and W-HfB 2 tips able to perform atomic-scale lithography on Si. Compared with traditional probes fabricated by etching or conventional sputter erosion, field-directed sputter sharpened probes have smaller radii and produce lithographic patterns 18-26% sharper with atomic-scale lithographic fidelity.

UR - http://www.scopus.com/inward/record.url?scp=84864854296&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84864854296&partnerID=8YFLogxK

U2 - 10.1038/ncomms1907

DO - 10.1038/ncomms1907

M3 - Article

VL - 3

JO - Nature Communications

JF - Nature Communications

SN - 2041-1723

M1 - 935

ER -