Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

S. W. Schmucker; N. Kumar; J. R. Abelson; S. R. Daly; G. S. Girolami; M. R. Bischof; D. L. Jaeger; R. F. Reidy; B. P. Gorman; J. Alexander; J. B. Ballard; J. N. Randall; J. W. Lyding

doi:10.1038/ncomms1907

Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

S. W. Schmucker, N. Kumar, J. R. Abelson, S. R. Daly, G. S. Girolami, M. R. Bischof, D. L. Jaeger, R. F. Reidy, B. P. Gorman, J. Alexander, J. B. Ballard, J. N. Randall, J. W. Lyding

Research output: Contribution to journal › Article

Abstract

Fabrication of ultrasharp probes is of interest for many applications, including scanning probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultrasharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. Here we describe a novel biased-probe field-directed sputter sharpening technique applicable to conductive materials, which produces nanometer and sub-nanometer sharp W, Pt-Ir and W-HfB 2 tips able to perform atomic-scale lithography on Si. Compared with traditional probes fabricated by etching or conventional sputter erosion, field-directed sputter sharpened probes have smaller radii and produce lithographic patterns 18-26% sharper with atomic-scale lithographic fidelity.

Original language	English (US)
Article number	935
Journal	Nature communications
Volume	3
DOIs	https://doi.org/10.1038/ncomms1907
State	Published - Aug 15 2012

ASJC Scopus subject areas

Chemistry(all)
Biochemistry, Genetics and Molecular Biology(all)
Physics and Astronomy(all)

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Schmucker, S. W., Kumar, N., Abelson, J. R., Daly, S. R., Girolami, G. S., Bischof, M. R., Jaeger, D. L., Reidy, R. F., Gorman, B. P., Alexander, J., Ballard, J. B., Randall, J. N., & Lyding, J. W. (2012). Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. Nature communications, 3, [935]. https://doi.org/10.1038/ncomms1907

Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. / Schmucker, S. W.; Kumar, N.; Abelson, J. R.; Daly, S. R.; Girolami, G. S.; Bischof, M. R.; Jaeger, D. L.; Reidy, R. F.; Gorman, B. P.; Alexander, J.; Ballard, J. B.; Randall, J. N.; Lyding, J. W.

In: Nature communications, Vol. 3, 935, 15.08.2012.

Research output: Contribution to journal › Article

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abstract = "Fabrication of ultrasharp probes is of interest for many applications, including scanning probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultrasharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. Here we describe a novel biased-probe field-directed sputter sharpening technique applicable to conductive materials, which produces nanometer and sub-nanometer sharp W, Pt-Ir and W-HfB 2 tips able to perform atomic-scale lithography on Si. Compared with traditional probes fabricated by etching or conventional sputter erosion, field-directed sputter sharpened probes have smaller radii and produce lithographic patterns 18-26% sharper with atomic-scale lithographic fidelity.",

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