Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

S. W. Schmucker, N. Kumar, J. R. Abelson, S. R. Daly, G. S. Girolami, M. R. Bischof, D. L. Jaeger, R. F. Reidy, B. P. Gorman, J. Alexander, J. B. Ballard, J. N. Randall, J. W. Lyding

Research output: Contribution to journalArticle

Abstract

Fabrication of ultrasharp probes is of interest for many applications, including scanning probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultrasharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. Here we describe a novel biased-probe field-directed sputter sharpening technique applicable to conductive materials, which produces nanometer and sub-nanometer sharp W, Pt-Ir and W-HfB 2 tips able to perform atomic-scale lithography on Si. Compared with traditional probes fabricated by etching or conventional sputter erosion, field-directed sputter sharpened probes have smaller radii and produce lithographic patterns 18-26% sharper with atomic-scale lithographic fidelity.

Original languageEnglish (US)
Article number935
JournalNature communications
Volume3
DOIs
StatePublished - Aug 15 2012

Fingerprint

Scanning Probe Microscopy
Lithography
lithography
Electrons
probes
Fabrication
Conductive materials
Scanning probe microscopy
fabrication
Erosion
Etching
erosion
etching
microscopy
radii
scanning

ASJC Scopus subject areas

  • Chemistry(all)
  • Biochemistry, Genetics and Molecular Biology(all)
  • Physics and Astronomy(all)

Cite this

Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. / Schmucker, S. W.; Kumar, N.; Abelson, J. R.; Daly, S. R.; Girolami, G. S.; Bischof, M. R.; Jaeger, D. L.; Reidy, R. F.; Gorman, B. P.; Alexander, J.; Ballard, J. B.; Randall, J. N.; Lyding, J. W.

In: Nature communications, Vol. 3, 935, 15.08.2012.

Research output: Contribution to journalArticle

Schmucker, SW, Kumar, N, Abelson, JR, Daly, SR, Girolami, GS, Bischof, MR, Jaeger, DL, Reidy, RF, Gorman, BP, Alexander, J, Ballard, JB, Randall, JN & Lyding, JW 2012, 'Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography', Nature communications, vol. 3, 935. https://doi.org/10.1038/ncomms1907
Schmucker, S. W. ; Kumar, N. ; Abelson, J. R. ; Daly, S. R. ; Girolami, G. S. ; Bischof, M. R. ; Jaeger, D. L. ; Reidy, R. F. ; Gorman, B. P. ; Alexander, J. ; Ballard, J. B. ; Randall, J. N. ; Lyding, J. W. / Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. In: Nature communications. 2012 ; Vol. 3.
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