TY - JOUR
T1 - Fabrication of three-dimensional photonic crystals using muitibeam interference lithography and electrodeposition
AU - Miyake, Masao
AU - Chen, Ying Chieh
AU - Braun, Paul V.
AU - Wiltzius, Pierre
PY - 2009/8/7
Y1 - 2009/8/7
N2 - The fabrication of a high-quality 3D photonic crystal through electrodeposition into a polymer template created by multibeam interference lithography followed by removal of the template was demonstrated. The polymer template was fabricated on a conductive, transparent indium tin oxide (ITO)-glass substrate by exposing a negative-tone photoresist, SU-8, to superimposed interference beams over a spot size of 3 mm. The 3D pattern is found to have an fcc-like symmetry with shrinkage in the (111) direction, which is oriented perpendicular to the substrate. The polished photonic crystals exhibit stronger iridescence than the nonpolished one, suggesting that the rough top surface that scatters light could be removed and a flatter surface with a uniformly ordered structures is created. In the reflection spectra of the template, a peak is observed at 1.3μm, which is in agreement with the calculated position of the (111) stop band.
AB - The fabrication of a high-quality 3D photonic crystal through electrodeposition into a polymer template created by multibeam interference lithography followed by removal of the template was demonstrated. The polymer template was fabricated on a conductive, transparent indium tin oxide (ITO)-glass substrate by exposing a negative-tone photoresist, SU-8, to superimposed interference beams over a spot size of 3 mm. The 3D pattern is found to have an fcc-like symmetry with shrinkage in the (111) direction, which is oriented perpendicular to the substrate. The polished photonic crystals exhibit stronger iridescence than the nonpolished one, suggesting that the rough top surface that scatters light could be removed and a flatter surface with a uniformly ordered structures is created. In the reflection spectra of the template, a peak is observed at 1.3μm, which is in agreement with the calculated position of the (111) stop band.
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U2 - 10.1002/adma.200802085
DO - 10.1002/adma.200802085
M3 - Article
AN - SCOPUS:68149091570
SN - 0935-9648
VL - 21
SP - 3012
EP - 3015
JO - Advanced Materials
JF - Advanced Materials
IS - 29
ER -